High vacuum sputter coater for highest resolution FE-SEM analysis Leica EM SCD500

The Leica EM SCD500 is a versatile high vacuum film deposition system designed to produce very thin, fine-grained metal films and conductive carbon coatings for highest resolution FE-SEM analysis.
The Leica EM SCD500 offers many conversion options in a single unit; high vacuum sputtering, carbon thread, thermal resistance and carbon rod evaporation, cryo preparation for freeze drying, freeze fracturing/etching, double replica, cryo coating and vacuum cryo transfer with the Leica EM VCT100.
Your Advantages
Many options in one unitMany conversion options in one single unit, all which can be easily adapted for a variety of applications. Vacuum chambers are interchangeable for different sample sizes and processes. |
High vacuum systemHigh vacuum system for best film quality and an oil-free vacuum and membrane diaphragm pump provides contamination-free coating |
Planetary drive stagePlanetary drive stage provides best uniformity of the sputter deposition; Rotary and tilting stages achieve excellent shadowing affects |
Stepless height adjustable specimen tableStepless height adjustable specimen table for defined film deposition with minimum specimen damage with pre-selectable and permanently stored sputtering parameters |
Etching-deviceA built-in high voltage etching device for surface cleaning improves adhesion of the subsequent coating or makes carbon films hydrophilic. |
Direct contact, consulting and support
- Find your local Leica Microsystems partner
- Get quotes - profit from owning a Leica Microsystems product
- Tailored advice - learn about the benefits Leica Microsystems provides for your work situation

