Ion milling is a perfect alternative for chemical etching, especially for polycrystalline metals, such as copper. Ion milling can be used to increase the contrast of the grain structure and their interfaces. In contrast to chemical etching the milling process is clean, safe and easy to operate. Ion energy and milling time depend on the milling rate of the metal.
|Acceleration voltage:||2 kV|
|Gun current:||1.5 mA|
|Milling time:||3 min|
Copper has a high milling rate, therefore the grain structure is clearly visible after a short milling time of only 3 min.