During Microscopy and Microanalysis 2014 in Hartford, Connecticut, there will be two tutorials at Leica Microsystems’ booth #902: “The Leica Cryo-CLEM Workflow Solution” will describe how to maintain cryo condition throughout an experiment and preserve cells in their native state better than traditional chemical fixation methods.
“Introduction to Confocal Microscopy for Surface-Metrology Applications” will explain how to measure critical height dimensions to the nanometer level on steep angles, providing a high level of lateral resolution and allowing researchers to study specimens in true color. Stunning images and reliable data can be extracted within seconds.
All information at a glance:
Venue: Connecticut Convention Center, 100 Columbus Blvd, Hartford, CT, 06103
August 5, 5:45 p.m.: “The Leica Cryo-CLEM Workflow Solution”
August 5, 5:45 p.m.: “Introduction to Confocal Microscopy for Surface-Metrology Applications”
No registration required. The tutorials are free of charge.
If you are interested in CLEM, you might find the ebook “Microscopy & Analysis Essential Knowledge Briefing on Correlative Light and Electron Microscopy” interesting. Please follow this link for download: CLEM ebook