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Leica EM TIC 3X Ion Beam Milling System

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Preparation of an IC-chip cross section: grinding and polishing of the chip cross section.

Cross-section Analysis for Electronics Manufacturing

This article describes cross-section analysis for electronics concerning quality control and failure analysis of printed circuit boards (PCBs) and assemblies (PCBAs), integrated circuits (ICs), etc.
Image of an integrated-circuit (IC) chip cross section acquired at higher magnification showing a region of interest.

Structural and Chemical Analysis of IC-Chip Cross Sections

This article shows how electronic IC-chip cross sections can be efficiently and reliably prepared and then analyzed, both visually and chemically at the microscale, with the EM TXP and DM6 M LIBS…
EBSD grain size distribution of the cross section of a gold wire within a silicon matrix from inside a CPU (central processing unit of a computer). The grains are highlighted with arbitrary colors.

High-Quality EBSD Sample Preparation

This article describes a method for EBSD sample preparation of challenging materials. The high-quality samples required for electron backscatter diffraction are prepared with broad ion-beam milling.
SEM image of the full Li-NMC electrode sample, showing the two porous layers and the metal film at the center of the structure.

Cross Section Ion Beam Milling of Battery Components

Sample Preparation of Lithium battery systems requires high quality surface preparation to evaluate their internal structure and morphology. Due to the brittle materials involved, preparing pristine…
3D reconstruction of an intercellular bridge in a C. elegans embryo

Download EM Workflow Solutions Booklet

This publication is a compilation of appropriate workflows for the most frequently used sample preparation methods, like Correlative Methodologies, Optogenetics & Electro-Physiology, Surface Analysis,…

Exploring the Structure and Life Cycle of Viruses

The SARS-CoV-2 outbreak started in late December 2019 and has since reached a global pandemic, leading to a worldwide battle against COVID-19. The ever-evolving electron microscopy methods offer a…
Product image EM TIC 3X

Application Booklet for EM TIC 3X

Today, ion beam milling is one of the most widely-used methods for preparing samples for electron microscopy. Download this 76-pages booklet today and learn how to improve your processes.

Workflows and Instrumentation for Cryo-electron Microscopy

Cryo-electron microscopy is an increasingly popular modality to study the structures of macromolecular complexes and has enabled numerous new insights in cell biology. In recent years, cryo-electron…

Introduction to Ion Beam Etching with the EM TIC 3X

In this article you can learn how to optimize the preparation quality of your samples by using the ion beam etching method with the EM TIC 3X ion beam milling machine. A short introduction of the…

Workflow Solutions for Sample Preparation Methods for Material Science

This brochure presents and explains appropriate workflow solutions for the most frequently required sample preparation methods for material science samples.

Studying the Microstructure of Natural Polymers in Fine Detail

The potential of cryogenic broad ion beam milling used in combination with scanning electron microscopy (cryo-BIB-SEM) for imaging and analyzing the microstructure of cryogenically stabilized soft…

Macroscale to Nanoscale Pore Analysis of Shale and Carbonate Rocks

Physical porosity in rocks, like shale and carbonate, has a large effect on the their storage capacity. The pore geometries also affect their permeability. Imaging the visible pore space provides…

Practical Applications of Broad Ion Beam Milling

Mechanical polishing can be time consuming and frustrating. It can also introduce unwanted artifacts when preparing cross-sectioned samples for electron backscatter diffraction (EBSD) in the scanning…
Microscopy Solutions for Battery Manufacturing

Battery Manufacturing

Battery manufacturing has several key challenges concerning inspection. Solutions for sample preparation and microscopic visual and chemical analysis are needed.

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工業用光学顕微鏡

材料解析には、金属合金、半導体、ガラス、セラミック、プラスチック、ポリマーなど、さまざまな材料の画像処理、測定、分析のための顕微鏡ソリューションが必要です。

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エレクトロニクスのための断面解析

電子・エレクトロニクス業界では、断面解析により、プリント基板(PCB)、アセンブリ(PCBA)、集積回路(IC)などのコンポーネントの故障メカニズムを詳細に解析します。

エレクトロニクスおよび半導体産業

電子機器や半導体にとって、PCB、ウェハー、ICチップ、バッテリーの効率的な検査、断面解析、清浄度分析、研究開発を可能にするソリューションは極めて重要です。
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