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DM8000 M & DM12000 M 광학 검사 시스템

신속한 결함 감지, 의사 결정 개선

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Optical microscope image, which is a composition of both brightfield and fluorescence illumination, showing organic contamination on a wafer surface. The inset images in the upper left corner show the brightfield image (above) and fluorescence image (below with dark background).

Visualizing Photoresist Residue and Organic Contamination on Wafers

As the scale of integrated circuits (ICs) on semiconductors passes below 10 nm, efficient detection of organic contamination, like photoresist residue, and defects during wafer inspection is becoming…
Image of burrs (red arrows) at the edge of a battery electrode acquired with a DVM6 digital microscope.

Burr Detection During Battery Manufacturing

See how optical microscopy can be used for burr detection on battery electrodes and determination of damage potential to achieve rapid and reliable quality control during battery manufacturing.
Images of the same area of a processed wafer taken with standard (left) and oblique (right) brightfield illumination using a Leica compound microscope. The defect on the wafer surface is clearly more visible with oblique illumination.

Rapid Semiconductor Inspection with Microscope Contrast Methods

Semiconductor inspection for QC of materials like wafers can be challenging. Microscope solutions that offer several contrast methods enable fast and reliable defect detection and efficient workflows.
Wafer

How to Boost your Microelectronic Component Inspection Performance

Do you need to see more when inspecting silicon wafers or MEMS? Would you like to get sharp and detailed sample images which are similar to those from electron microscopes? Watch this free webinar…

Brief Introduction to Surface Metrology

This report briefly discusses several important metrology techniques and standard definitions commonly used to assess the topography of surfaces, also known as surface texture or surface finish. With…

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