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Leica EM RES102 Ion Beam Milling Systems Sample Preparation for Electron Microscopy Products Home Leica Leica Microsystems
  • Automobilindustrie und Transport Industriemikroskope

    Leica ist Ihr zuverlässiger Partner für Bildgebungslösungen, die Ihnen zu einem Wettbewerbsvorteil verhelfen können. Mit unseren intelligenten Mikroskopsystemen können Sie sich voll darauf…
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    Für höchst präzise Montage, Inspektion, Messung, Analyse und Dokumentation im Bereich Metall und Maschinenbau sind mikroskopische Bildgebungslösungen erforderlich. Mit den kostengünstigen Mikroskopen…
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    Die nachhaltige Versorgung der globalen Infrastruktur mit Energie hat grundsätzlich hohe Priorität. Die leistungsstarken und anpassbaren Mikroskopielösungen von Leica Microsystems unterstützen Sie…
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  • Workflow Solutions for Industrial Research

    This brochure presents and explains appropriate workflow solutions for the most frequently required sample preparation methods for material science samples.
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  • Contrast Enhancement of Polycrystalline Metals - Sample Preparation for SEM

    Application Note - Ion milling is a perfect alternative for chemical etching, especially for polycrystalline metals, such as copper. Ion milling can be used to increase the contrast of the grain…
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  • Porous Ceramics - Sample Preparation for SEM

    Application Note for Leica EM RES102 - Ceramic membrane filters with pore sizes down to a few nanometres must be investigated in cross-section with regard to the structure of the pores. The smallest…
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  • Removal of Surface Layers - Sample Preparation for SEM and TEM

    Application Note for Leica EM RES102 - Sometimes it is necessary to remove surface layers to gain access to the real surface structure. That can be a native oxide, or layers coming from the…
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  • Multilayer Systems with Widely Different Sputter Rates - Sample Preparation for TEM

    Application Note for Leica EM RES102 - The multi-layer system to be prepared in cross-section consists of a Si substrate, a TiN layer with a thickness of a few nm and a 500 nm W layer. All these…
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  • High resolution XTEM lattice [110] image of conventional prepared InP

    In-Containing Compound Semiconductors - Sample Preparation for TEM

    Application Note for Leica EM RES102 - Previous studies showed that surface accumulation of In occurs when InP was milled in a conventional way with Ar ions. The consequence is In islands on the…
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  • "Shallow Trench Isolation" Structures - Sample Preparation for TEM

    Application Note for Leica EM RES102 - The cross-sectional preparation of structured semiconductor materials requires a very thorough mechanical pre-preparation. In doing this, it must be ensured that…
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  • Paper Samples - Sample Preparation for SEM

    Application Note for Leica EM RES102 - A coated paper sample has been prepared with ion beam slope cutting in order to test the procedure with regard to its applicability. With the use of ion beam…
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  • Metal Films and Sheets - Sample Preparation for TEM

    Application Note for Leica EM RES102 - Most metal films already have a thickness that requires no further mechanical pre-preparation. Frequently, however, they are also domed, which can lead to…
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  • Cross-Sectional Preparation of Structured Semiconductor Materials for TEM

    Application Note for Leica EM RES102 - The vertical layer construction of a semiconductor structure should be examined as a TEM cross-sectional sample. In addition to the specific preparation of the…
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  • Contrast Enhancement of Polished Cross Sections of Semiconductor Structures - Sample Preparation for SEM

    Application Note for Leica EM RES102 - The surfaces of polished cross sections often show fine scratches and residues of the removed material or of the abrasive material. The artefacts are strongly…
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  • Surface Modification of ZnAg Sample - Sample Preparation for SEM

    Application Note for Leica EM RES102 - By means of cleaning, polishing and contrast enhancement a soft ZnAg sample should be prepared to obtain information concerning the grain structure and…
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  • Thin Metal Foils with Coatings - Sample Preparation for SEM

    Application Note for Leica EM RES102 - Thin foils are mostly unstable because of their thickness of a few microns. This makes it difficult to do slope cutting without any protection of the sample. A…
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  • Ion Beam Polishing of Sample Surfaces - Sample Preparation for SEM

    Application Note for Leica EM RES102 - Ion milling can be used to reduce the roughness of sample surfaces. Small angles less than 6° with respect to the sample surface are necessary. The high voltage…
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  • Cleaning of Smeared Sample Surfaces - Sample Preparation for SEM

    Application Note for Leica EM RES102 - Mechanical polishing of soft materials or hard / soft material combinations is tricky. The mechanical polishing process leads very often to smearing of the soft…
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  • Ceramics - Sample Preparation for TEM

    Application Note for Leica EM RES102 - Ceramic samples are mostly very brittle, and are therefore very difficult to thin mechanically to a low starting thickness for ion beam milling. The ion beam…
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  • TEM Sample Preparation Made Easy - Prepare TEM Specimen by Broad Beam Argon Ion Milling

    Quantitative and analytical analysis at high spatial resolution places stringent demands on the quality of the produced TEM specimens. Pristine and high-quality samples are indispensible for atomic…
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